New LaunchApr 27, 2026, 08:22 AM
ACMR Ships First PECVD SiCN System to Leading Semiconductor Maker
AI Summary
ACM Research, Inc. announced the shipment of its first plasma-enhanced chemical vapor deposition (PECVD) silicon carbonitride (SiCN) system to a leading semiconductor manufacturer. This system, part of the Saturn Series, features a proprietary three-station deposition architecture and "One Station, One RF" control software, designed for advanced back-end-of-line (BEOL) and advanced packaging applications. It aims to provide enhanced control and consistency for complex semiconductor manufacturing and next-generation device integration.
Key Highlights
- ACMR shipped its first plasma-enhanced chemical vapor deposition (PECVD) silicon carbonitride (SiCN) system.
- The system was shipped to a leading semiconductor manufacturer for validation.
- It features a proprietary three-station deposition architecture, a world's first for PECVD design.
- Includes "One Station, One RF" control software for independent plasma control at each station.
- Designed for advanced back-end-of-line (BEOL) applications at 55-nanometer and below.
- Supports 300-millimeter wafer processing and temperatures up to 400 degrees Celsius.
- The system is configured with four load ports and three process chambers for high efficiency.